Characterization of H2O-inductively coupled plasma for dry etching

被引：9
作者：
Matsutani, A. [1 ]
Ohtsuki, H. [2 ]
Koyama, F. [3 ]
机构：
[1] Tokyo Inst Technol, Tech Dept, Midori Ku, R2-21,4259 Nagatsuta, Yokohama, Kanagawa 2268503, Japan
[2] Samco Inc, Fujimi ku, Kyoto 6128443, Japan
[3] Tokyo Inst Technol, Precis & Intelligence Lab, Yokohama, Kanagawa 2268503, Japan
来源：
PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY | 2008年 / 100卷
关键词：
D O I：
10.1088/1742-6596/100/6/062022
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页数：4
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