Plasma polymerization of trimethylsilane in cascade arc discharge

被引:0
作者
Lin, YS
Yasuda, HK
机构
[1] UNIV MISSOURI,DEPT CHEM ENGN,COLUMBIA,MO 65211
[2] UNIV MISSOURI,CTR SURFACE SCI & PLASMA TECHNOL,COLUMBIA,MO 65211
关键词
plasma polymerization; cascade are discharge; thin film deposition; vacuum deposition;
D O I
暂无
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Plasma polymerization of trimethylsilane (TMS) in cascade are discharge was experimentally investigated. It was found that the deposition rates of methane and TMS plasma polymer were dependent on plasma parameters, and the surface characteristics of plasma polymer were also dependent on plasma variables. The following plasma variables were studied: are current, argon flow rate, TMS flow rate, chamber pressure, substrate axial, and radial positions. Carbon, silicon, and oxygen were the main elements observed in TMS polymer films obtained by x-ray photoelectron spectroscopy(XPS). Powder-like TMS polymer films were observed by scanning electron microscopy (SEM). The size distribution of the powder-like particles was strongly dependent on deposition parameters. (C) 1997 John Wiley & Sons, Inc.
引用
收藏
页码:1653 / 1665
页数:13
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