Simulation approach of atomic layer deposition in large 3D structures

被引：9

作者：

Schwille, Matthias C. ^{[1
]}

Barth, Jonas ^{[1
]}

Schoessler, Timo ^{[1
]}

Schoen, Florian ^{[1
]}

Bartha, Johann W. ^{[2
]}

Oettel, Martin ^{[3
]}

机构：

[1] Robert Bosch GmbH, D-72762 Reutlingen, Germany

[2] Tech Univ Dresden, Dept Elect Engn & Informat Technol, IHM, D-01062 Dresden, Germany

[3] Tuebingen Univ, Inst Appl Phys, D-72076 Tubingen, Germany

来源：

MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING | 2017年 / 25卷 / 03期

关键词：

thin films; atomic layer deposition; growth simulation; TUBES; MODEL;

D O I：

10.1088/1361-651X/aa5f9d

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a new simulation method predicting thicknesses of thin films obtained by atomic layer deposition in high aspect ratio 3D geometries as they appear in MEMS manufacturing. The method features a Monte-Carlo computation of film deposition in free molecular flow, as well as in the Knudsen and diffusive gas regime, applicable for large structures. We compare our approach to analytic and simulation results from the literature. The capability of the method is demonstrated by a comparison to experimental film thicknesses in a large 3D structure. Finally, the feasability to extract process parameters, i.e. sticking coefficients is shown.

引用

页数：18

共 17 条

[1] A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High-Aspect-Ratio Nanopores
Adomaitis, Raymond A.
[J]. CHEMICAL VAPOR DEPOSITION, 2011, 17 (10-12) : 353 - 365
[2] [Anonymous], 2002, HDB PHYS
[3] Cosine law at the atomic scale: Toward realistic simulations of Knudsen diffusion
Celestini, Franck
Mortessagne, Fabrice
[J]. PHYSICAL REVIEW E, 2008, 77 (02):
[4] Chapman S, 1970, MATH THEORY NONUNIFO, P80
[5] Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability
Dendooven, J.
Deduytsche, D.
Musschoot, J.
Vanmeirhaeghe, R. L.
Detavernier, C.
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (04) : P63 - P67
[6] Gluch R, 2010, P EMRS 2009 SPRING M, V518, P4553
[7] Comparison between Monte Carlo and analytical calculation of the conductance of cylindrical and conical tubes
Gómez-Goñi, J
Lobo, PJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 1452 - 1457
[8] A kinetic model for step coverage by atomic layer deposition in narrow holes or trenches
Gordon, RG
Hausmann, D
Kim, E
Shepard, J
[J]. CHEMICAL VAPOR DEPOSITION, 2003, 9 (02) : 73 - 78
[9] Modeling precursor diffusion and reaction of atomic layer deposition in porous structures
Keuter, Thomas
Menzler, Norbert Heribert
Mauer, Georg
Vondahlen, Frank
Vassen, Robert
Buchkremer, Hans Peter
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2015, 33 (01):
[10] Step coverage modeling of thin films in atomic layer deposition
Kim, Ja-Yong
Ahn, Ji-Hoon
Kang, Sang-Won
Kim, Jin-Hyock
[J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (07)

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