High-NA, anamorphic or aspheric microlenses for telecommunications and data storage

被引：0
作者：
McIntyre, KJ [1 ]
Emmel, P [1 ]
Gretton, G [1 ]
Hagen, C [1 ]
Piscani, E [1 ]
Raguin, DH [1 ]
Sales, TRM [1 ]
机构：
[1] Rochester Photon Corp, Rochester, NY 14623 USA
来源：
OPTICS IN COMPUTING 2000 | 2000年 / 4089卷
关键词：
D O I：
暂无
中图分类号：
TP301 [理论、方法];
学科分类号：
081202 ;
摘要：
A new wafer-based process has been developed for manufacturing high-NA, anamorphic or aspheric microlenses that satisfy many of the demands of highperformance optical systems in telecommunications and data storage. Lens materials include fused silica and silicon. (C) 1999 Optical Society of America OCIS codes: (060.2340) Fiber Optics Components; (220.4000) Microstructure Fabrication.
引用
收藏
页码：642 / 644
页数：3
相关论文
共 50 条
  • [41] EUV lithography: High-NA EUV optics are on their way
    Laser Focus World, 7
  • [42] High-NA broadband achromatic metalens in the visible range
    Sun, XiaoHong
    Yan, MengMeng
    Huo, Shuang
    Fan, JiaJin
    Zhao, SaiLi
    Guo, RuiJun
    Zeng, Yong
    OPTICAL MATERIALS EXPRESS, 2023, 13 (09) : 2690 - 2698
  • [43] High-Performance Continuous Aspheric Microlenses Array For Shack-Hartmann Sensor
    Qiu, Chuankai
    Pan, Li
    Li, Fei
    Yue, Qu
    Liu, Ling
    Luo, Xiangang
    2008 IEEE PHOTONICSGLOBAL@SINGAPORE (IPGC), VOLS 1 AND 2, 2008, : 795 - 798
  • [44] Experimental verification of high-NA imaging simulations using SHARP
    Davydova, Natalia
    Liu, Fei
    Benk, Markus
    van Setten, Eelco
    Bottiglieri, Gerardo
    van Oosten, Anton
    McNamara, John
    Wiaux, Vincent
    Franke, Joern-Holger
    Goldberg, Kenneth
    Nam, D. S.
    Zekry, Joseph
    Naulleau, Patrick
    Fliervoet, Timon
    Carpaij, Rene
    EXTREME ULTRAVIOLET LITHOGRAPHY 2020, 2020, 11517
  • [45] Lateral shearing interferometry for high-NA EUV wavefront metrology
    Zhu, Wenhua
    Miyakawa, Ryan
    Chen, Lei
    Naulleau, Patrick
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
  • [46] Extruded polymer preforms for high-NA polymer microstructured fiber
    Ebendorff-Heidepriem, Heike
    Monro, Tanya
    van Eijkelenborg, Martijn A.
    Large, Maryanne J. C.
    2006 OPTICAL FIBER COMMUNICATION CONFERENCE/NATIONAL FIBER OPTIC ENGINEERS CONFERENCE, VOLS 1-6, 2006, : 1489 - +
  • [47] High-NA EUV lithography: current status and outlook for the future
    Levinson, Harry J.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SD)
  • [48] High-NA metrology and sensing on Berkeley MET5
    Miyakawa, Ryan
    Anderson, Chris
    Naulleau, Patrick
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII, 2017, 10143
  • [49] Simultaneous Correlative Scanning Electron and High-NA Fluorescence Microscopy
    Liv, Nalan
    Zonnevylle, A. Christiaan
    Narvaez, Angela C.
    Effting, Andries P. J.
    Voorneveld, Philip W.
    Lucas, Miriam S.
    Hardwick, James C.
    Wepf, Roger A.
    Kruit, Pieter
    Hoogenboom, Jacob P.
    PLOS ONE, 2013, 8 (02):
  • [50] High-NA EUV Lithography Exposure Tool: Program Progress
    Van Schoot, Jan
    van Setten, Eelco
    Troost, Kars
    Lok, Sjoerd
    Peeters, Rudy
    Stoeldraijer, Judon
    Benschop, Jos
    Zimmermann, Joerg
    Graeupner, Paul
    Kuerz, Peter
    Kaiser, Winfried
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
12345