Aligned carbon nanotubes for nanoelectronics

被引:111
作者
Choi, WB
Bae, E
Kang, D
Chae, S
Cheong, BH
Ko, JH
Lee, EM
Park, W
机构
[1] Florida Int Univ, Dept Mat & Mech, Engn Ctr 3465, Miami, FL 33174 USA
[2] Samsung Adv Inst Technol, Suwon, South Korea
关键词
D O I
10.1088/0957-4484/15/10/003
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We discuss the central issues to be addressed for realizing carbon nanotube (CNT) nanoelectronics. We focus on selective growth, electron energy bandgap engineering and device integration. We have introduced a nanotemplate to control the selective growth, length and diameter of CNTs. Vertically aligned CNTs are synthesized for developing a vertical CNT-field effect transistor (FET). The ohmic contact of the CNT/metal interface is formed by rapid thermal annealing. Diameter control, synthesis of Y-shaped CNTs and surface modification of CNTs open up the possibility for energy bandgap modulation. The concepts of an ultra-high density transistor based on the vertical-CNT array and a nonvolatile memory based on the top gate structure with an oxide-nitride-oxide charge trap are also presented. We suggest that the deposited memory film can be used for the quantum dot storage due to the localized electric field created by a nano scale CNT-electron channel.
引用
收藏
页码:S512 / S516
页数:5
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