Zero-potential condition in thermally poled silica samples: evidence of a negative electric field outside the depletion layer

被引：21
作者：
Quiquempois, Y [1 ]
Kudlinski, A [1 ]
Martinelli, G [1 ]
机构：
[1] Univ Sci & Tech Lille Flandres Artois, Lab Phys Lasers Atom & Mol, Ctr Etudes & Rech Lasers & Appl, F-59655 Villeneuve Dascq, France
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 2005年 / 22卷 / 03期
关键词：
D O I：
10.1364/JOSAB.22.000598
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The second-harmonic signal generated within poled silica disks is monitored in real time as the sample is etched with hydrofluoric acid. An oscillating signal is observed when the cathodic side of the sample is etched. This result is in good agreement with the condition of zero potential difference between the two surfaces of the disk. As a result, a negative nonlinear coefficient is induced outside the alkali ion depleted layer. (C) 2005 Optical Society of America.
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页码：598 / 604
页数：7
相关论文
共 11 条
[1]   Secondary ion mass spectrometry study of space-charge formation in thermally poled fused silica [J].
Alley, TG ;
Brueck, SRJ ;
Wiedenbeck, M .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (12) :6634-6640
[2]   Dynamics of the second-order nonlinearity in thermally poled silica glass [J].
Faccio, D ;
Pruneri, V ;
Kazansky, PG .
APPLIED PHYSICS LETTERS, 2001, 79 (17) :2687-2689
[3]  
Kazansky PG, 1996, APPL PHYS LETT, V68, P269, DOI 10.1063/1.115659
[4]   Complete characterization of the nonlinear spatial distribution induced in poled silica glass with a submicron resolution [J].
Kudlinski, A ;
Quiquempois, Y ;
Lelek, M ;
Zeghlache, H ;
Martinelli, G .
APPLIED PHYSICS LETTERS, 2003, 83 (17) :3623-3625
[5]  
KUDLINSKI A, 2003, OSA TRENDS OPTICS PH, V93, P213
[6]   Etching of silica glass under electric fields [J].
Lesche, B ;
Garcia, FC ;
Hering, EN ;
Margulis, W ;
Carvalho, ICS ;
Laurell, F .
PHYSICAL REVIEW LETTERS, 1997, 78 (11) :2172-2175
[7]   Interferometric study of poled glass under etching [J].
Margulis, W ;
Laurell, F .
OPTICS LETTERS, 1996, 21 (21) :1786-1788
[8]   LARGE 2ND-ORDER NONLINEARITY IN POLED FUSED-SILICA [J].
MYERS, RA ;
MUKHERJEE, N ;
BRUECK, SRJ .
OPTICS LETTERS, 1991, 16 (22) :1732-1734
[9]   Model of charge migration during thermal poling in silica glasses: Evidence of a voltage threshold for the onset of a second-order nonlinearity [J].
Quiquempois, Y ;
Godbout, N ;
Lacroix, S .
PHYSICAL REVIEW A, 2002, 65 (04) :438161-4381614
[10]  
QUIQUEMPOIS Y, UNPUB APPL PHYS LETT
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