Cycle forecasting EWMA (CF-EWMA) approach for drift and fault in mixed-product run-to-run process

被引:17
作者
Ai, Bing [1 ]
Zheng, Ying [1 ]
Wang, Yanwei [2 ]
Jang, Shi-Shang [3 ]
Song, Tao [1 ]
机构
[1] Huazhong Univ Sci & Technol, Dept Control Sci & Engn, Wuhan 430074, Hubei, Peoples R China
[2] Huazhong Univ Sci & Technol, CAD Ctr, Wuhan 430074, Hubei, Peoples R China
[3] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu, Taiwan
关键词
Run-to-run controller; Mixed-product drifted process; Cycle forecasting EWMA (CF-EWMA); Fault tolerant cycle forecasting EWMA (FTCF-EWMA); STATE ESTIMATION; CONTROLLER; STABILITY;
D O I
10.1016/j.jprocont.2010.03.004
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
In semiconductor manufacturing processes, mixed-products are usually fabricated on the same set of process tool with different recipes Run-to-run controllers which based on the exponential weighted moving average (EWMA) statistic are probably the most frequently used in industry for the quality control of certain semiconductor manufacturing process steps. However, for mixed-product drifted process, if the break length of a product is large, then the process output at the beginning runs of each cycle will far deviate from the target value which will lead to a possible high rework rate and lots of waste wafers Therefore, this study aims to develop a new approach named cycle forecasting EWMA (CF-EWMA) approach to deal with the problem of large deviations in the first few runs of each cycle Furthermore, a common fault. me., the step fault, is also considered in this paper, and fault tolerant cycle forecasting EWMA (FTCF-EWMA) approach is proposed. Simulation study shows that the proposed approaches are effective (C) 2010 Elsevier Ltd All rights reserved !
引用
收藏
页码:689 / 708
页数:20
相关论文
共 20 条
  • [1] The optimal drift-compensatory and fault tolerant approach for mixed-product run-to-run control
    Ai, Bing
    Zheng, Ying
    Jang, Shi-Shang
    Wang, Yanwei
    Ye, Lin
    Zhou, Chunjie
    [J]. JOURNAL OF PROCESS CONTROL, 2009, 19 (08) : 1401 - 1412
  • [2] [Anonymous], THESIS MIT CAMBRIDGE
  • [3] BOX GEP, 1963, B INT STATIST INST, V40, P943
  • [4] Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes
    Firth, Stacy K.
    Campbell, W. Jarrett
    Toprac, Anthony
    Edgar, Thomas F.
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2006, 19 (03) : 298 - 315
  • [5] A General Harmonic Rule Controller for Run-to-Run Process Control
    He, Fangyi
    Wang, Kaibo
    Jiang, Wei
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2009, 22 (02) : 232 - 244
  • [6] STABILITY AND SENSITIVITY OF AN EWMA CONTROLLER
    INGOLFSSON, A
    SACHS, E
    [J]. JOURNAL OF QUALITY TECHNOLOGY, 1993, 25 (04) : 271 - 287
  • [7] Robust forecasts and run-to-run control for processes with linear drifts
    Lee, Jay H.
    Kiew, Choon Meng
    [J]. JOURNAL OF PROCESS CONTROL, 2009, 19 (04) : 636 - 643
  • [8] Ning Z, 2001, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, P101
  • [9] Observability and state estimation for multiple product control in semiconductor manufacturing
    Pasadyn, AJ
    Edgar, TE
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2005, 18 (04) : 592 - 604
  • [10] Device dependent control of chemical-mechanical polishing of dielectric films
    Patel, NS
    Miller, GA
    Guinn, C
    Sanchez, AC
    Jenkins, ST
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2000, 13 (03) : 331 - 343