New approach to rapid characterization of single-crystalline silicon carbide

被引:2
|
作者
Mynbaeva, M. G. [1 ]
机构
[1] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
关键词
SIC MONOCRYSTALS; N-TYPE; GROWTH; DEFECTS; WAFERS;
D O I
10.1134/S1063785010010256
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new approach to the characterization of single-crystalline silicon carbide (SiC) ingots is proposed, which can be used for the rapid diagnostics of material quality under large-scale commercial production conditions. The proposed method can reveal various defects, such as polytype inclusions, small-angle grain boundaries, dislocations, micropipes, and inhomogeneous dopant distribution and can be used to optimize technological regimes for growing bulk SiC single crystals.
引用
收藏
页码:80 / 82
页数:3
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