Stochastic collocation for device-level variability analysis in integrated photonics

被引：27

作者：

Xing, Yufei ^{[1
]}

Spina, Domenico ^{[2
]}

Li, Ang ^{[1
]}

Dhaene, Tom ^{[2
]}

Bogaerts, Wim ^{[1
,3
]}

机构：

[1] Univ Ghent, IMEC, Photon Res Grp, Dept Informat Technol,Ctr Nano & Biophoton, B-9000 Ghent, Belgium

[2] Univ Ghent, iMinds, Dept Informat Technol, Internet Based Commun Networks & Serv IBCN, Gaston Crommenlaan 8 Bus 201, B-9050 Ghent, Belgium

[3] Luceda Photon, B-9200 Dendermonde, Belgium

来源：

PHOTONICS RESEARCH | 2016年 / 4卷 / 02期

关键词：

Stochastic models - Monte Carlo methods - Numerical methods - Photonics - Photonic devices - Uncertainty analysis;

D O I：

10.1364/PRJ.4.000093

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate the use of stochastic collocation to assess the performance of photonic devices under the effect of uncertainty. This approach combines high accuracy and efficiency in analyzing device variability with the ease of implementation of sampling-based methods. Its flexibility makes it suitable to be applied to a large range of photonic devices. We compare the stochastic collocation method with a Monte Carlo technique on a numerical analysis of the variability in silicon directional couplers. (C) 2016 Chinese Laser Press

引用

页码：93 / 100

页数：8

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