Measurements of electron density in helicon-wave excited high-density reactive plasmas by vacuum ultraviolet emission spectroscopy

被引：2
作者：
Kawai, Y [1 ]
Sasaki, K [1 ]
Kadota, K [1 ]
机构：
[1] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648603, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 1998年 / 7卷 / 01期
关键词：
D O I：
10.1088/0963-0252/7/1/006
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
This paper reports vacuum ultraviolet (VUV) emission spectroscopy for non-contact measurements of the electron density in reactive plasmas. The advantages of the VUV emission spectroscopy compared with the visible one are (1) the applicability to high-density plasmas close to 10(14) cm(-3) and (2) the insensitivity against the variation of the velocity distribution function of electrons. in this paper, the VUV emission spectroscopy is adapted to helicon-wave excited high-density fluorocarbon plasmas. As a result, a reasonable agreement has been obtained between the result of the present method and the electron density measured by a microwave interferometer. The accuracy of the present method is discussed in detail considering several sources of error.
引用
收藏
页码：36 / 40
页数：5
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