CHARIOT: software tool for modeling SEM signal and e-beam lithography

被引：42
作者：
Babin, S. [1 ]
Borisov, S. [1 ]
Ivanchikov, A. [1 ]
Ruzavin, I. [1 ]
机构：
[1] Abeam Technol, Castro Valley, CA 94546 USA
来源：
PROCEEDINGS OF THE SEVENTH INTERNATIONAL CONFERENCE ON CHARGED PARTICLE OPTICS (CPO-7) | 2008年 / 1卷 / 01期
关键词：
Monte Carlo; Software; Electron Beam; Energy deposition; Charging; Secondary electrons;
D O I：
10.1016/j.phpro.2008.07.110
中图分类号：
O412 [相对论、场论]; O572.2 [粒子物理学];
学科分类号：
摘要：
An advanced Monte Carlo software tool CHARIOT was developed to simulate image formation in SEM, energy deposition in EBL, electron spectra, and charging of a target. Scattering of an electron beam in a microstructure, generation of secondary electrons, and characteristics of the detector, as well as the material and shape of the features, determine electron scattering and a SEM signal. Physical and mathematical models are described to comply with an accuracy required by modern technology, especially at low voltage electrons. Examples of applications to CD-SEM, defect inspection, EBL, and electron spectrometer are presented. (C) 2008 Elsevier B. V. All rights reserved.
引用
收藏
页码：305 / 313
页数：9
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