Effect of bilayer period on the oxidation and corrosion resistance of Pb-Ti/MoS2 nanoscale multilayer films

The Pb-Ti/MoS2 nanoscale multilayer films are synthesized by unbalanced magnetron sputtering. The effect of bilayer period on the structure, oxidation, and corrosion resistance of the nanoscale multilayer films has been investigated. For the Pb-Ti/MoS2 nanoscale multilayer films, the basal (002) planes of MoS2 are oriented parallel to the substrate, and the crystallite size gradually increases with the bilayer period, obtaining a maximum value when the bilayer period is 17.1 nm. A further increase in the bilayer period results in a decrease in the crystallite size. The oxidation resistance of the Pb-Ti/MoS2 nanoscale multilayer films is systematically evacuated by sliding against the GCr15 pair under humid air. The anticorrosion properties are investigated by electrochemical measurements and sliding against the GCr15 pair after the salt spray tests. The results indicate that oxidation and corrosion resistance of the nanoscale multilayer films first increases with an increase of the bilayer period, and the nanoscale multilayer film with a period of 17.1 nm obtains the best antioxidation and anticorrosion resistance. This benefits us to select the MoS2-based multilayer films for different operating conditions. Published by the AVS.