Study sf current leakage in InAs p-i-n photodetectors

被引:6
作者
Lin, RM [1 ]
Tang, SF
Kuan, CH
机构
[1] Chang Gung Univ, Dept Elect Engn, Tao Yuan, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 10764, Taiwan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期
关键词
D O I
10.1116/1.1319693
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The current leakages of InAs photodiodes have been systematically studied by adding undoped layers having thicknesses of 0, 0.30, and 0.72 mum between the p-n junction. At reverse bias V = - 0.5 V, the dark currents of the InAs p-i-n diodes with undoped layer thicknesses of 0, 0.30, and 0.72 mum are about 5 x 10(-6), 7 x 10(-8), and 1 x 10(-10) A, respectively, at 77 K. The leakage current of the InAs p-n diode was successfully reduced by adding 0.72-mum-thick undoped layer between the p-n junction. (C) 2000 American Vacuum Society. [S0734-211X(00)04406-1].
引用
收藏
页码:2624 / 2626
页数:3
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