Band-gap engineering of SnO2

被引:76
作者
Mounkachi, O. [1 ]
Salmani, E. [2 ]
Lakhal, M. [1 ,2 ]
Ez-Zahraouy, H. [2 ]
Hamedoun, M. [1 ]
Benaissa, M. [2 ]
Kara, A. [3 ]
Ennaoui, A. [4 ,5 ]
Benyoussef, A. [1 ,2 ]
机构
[1] MAScIR, Inst Nanomat & Nanotechnol, Rabat, Morocco
[2] Univ Mohammed 5, Fac Sci, LMPHE, Rabat, Morocco
[3] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[4] QEERI, Doha, Qatar
[5] HBKU, Doha, Qatar
关键词
Semiconductors; SnO2; Multilayer; DFT; Band-gap engineering; QUANTUM CONFINEMENT; THIN-FILMS; TEMPERATURE; DEPOSITION; WIRES; DOTS;
D O I
10.1016/j.solmat.2015.09.062
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Using first principles calculations based on density functional theory (DFT), the electronic properties of SnO2 bulk and thin films are studied. The electronic band structures and total energy over a range of SnO2-multilayer have been studied using DFT within the local density approximation (LDA). We show that changing the interatomic distances and relative positions of atoms could modify the band-gap energy of SnO2 semiconductors. Electronic-structure calculations show that band-gap engineering is a powerful technique for the design of new promising candidates with a direct band-gap. Our results present an important advancement toward controlling the band structure and optoelectronic properties of few-layer SnO2 via strain engineering, with important implications for practical device applications. (C) 2015 Published by Elsevier B.V.
引用
收藏
页码:34 / 38
页数:5
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