Holographic method for a direct growth of three-dimensional photonic crystals by chemical vapor deposition

被引:15
|
作者
Duneau, M [1 ]
Delyon, F
Audier, M
机构
[1] Ecole Polytech, CPHT, UMR 7644, F-91128 Palaiseau, France
[2] Inst Natl Polytech Grenoble, LMGP, F-38402 St Martin Dheres, France
关键词
D O I
10.1063/1.1776322
中图分类号
O59 [应用物理学];
学科分类号
摘要
A method to obtain three-dimensional (3D) photonic crystals by chemical vapor deposition (CVD) is presented. Campbell [ N. Campbell, N. Sharp, M. T. Harrison, R. G. Denning, and A. J. Tuberfield, Nature 404, 53 (2000) ] have developed a method of holographic lithography for producing 3D periodic structures with photoresists. Their method is adapted in two main directions. First, we optimize the geometry of the interferometer with respect to polarizations and relative intensities of the beams. The construction of an interferometer adapted to a ultraviolet laser source at 355 nm is described and direct observations of the interference field obtained by a video camera are presented. Second, we show that a laser source with short pulses could induce a suitable thermal contrast on a convenient substrate in order to grow a 3D photonic crystal by CVD. (C) 2004 American Institute of Physics.
引用
收藏
页码:2428 / 2436
页数:9
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