Nanofabrication challenges for NEMS

被引：6

作者：

Cui, Zheng ^{[1
]}

Gu, Changzhi ^{[2
]}

机构：

[1] Rutherford Appleton Lab, Cent Microstruct Facil, Didcot OX11 0QX, Oxon, England

[2] Chinese Acad Sci, Inst Phys, Microfabricat Lab, Beijing 100080, Peoples R China

来源：

2006 1ST IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS, VOLS 1-3 | 2006年

关键词：

nanofabrication; microfabrication; NEMS; MEMS;

D O I：

10.1109/NEMS.2006.334855

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Nanofabrication is the basis for any NEMS. How small a structure can be made? What are the available technologies for making nanostructures? These are the questions constantly asked by NEMS researchers. This paper gave an overview of current nanofabrication technologies and the challenges for NEMS applications. The techniques for making nanostructures are grouped into direct, indirect and self-assembly methods. Each group of techniques is analyzed for their capability and limits, which provides a rough guide for researchers to choose appropriate nanofabrication routes for their own applications.

引用

页码：607 / +

页数：2

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