Scanning X-ray microdiffraction with submicrometer white beam for strain/stress and orientation mapping in thin films

被引:220
作者
Tamura, N
MacDowell, AA
Spolenak, R
Valek, BC
Bravman, JC
Brown, WL
Celestre, RS
Padmore, HA
Batterman, BW
Patel, JR
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, ALS, Berkeley, CA 94720 USA
[2] Agere Syst, Murray Hill, NJ 07974 USA
[3] Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
[4] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[5] Stanford Univ, Stanford Linear Accelerator Ctr, SSRL, Stanford, CA 94309 USA
关键词
X-ray microdiffraction; thin films; strain/stress;
D O I
10.1107/S0909049502021362
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Scanning X-ray microdiffraction (muSXRD) combines the use of high-brilliance synchrotron sources with the latest achromatic X-ray focusing optics and fast large-area two-dimensional-detector technology. Using white beams or a combination of white and monochromatic beams, this technique allows for the orientation and strain/stress mapping of polycrystalline thin films with submicrometer spatial resolution. The technique is described in detail as applied to the study of thin aluminium and copper blanket films and lines following electromigration testing and/or thermal cycling experiments. It is shown that there are significant orientation and strain/stress variations between grains and inside individual grains. A polycrystalline film when investigated at the granular (micrometer) level shows a highly mechanically inhomogeneous medium that allows insight into its mesoscopic properties. If the muSXRD data are averaged over a macroscopic range, results show good agreement with direct macroscopic texture and stress measurements.
引用
收藏
页码:137 / 143
页数:7
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