Structural, electrical and optical properties of Dy doped ZnO thin films grown by buffer assisted pulsed laser deposition

被引:42
|
作者
Ajimsha, R. S. [1 ]
Das, A. K. [1 ]
Singh, B. N. [1 ]
Misra, P. [1 ]
Kukreja, L. M. [1 ]
机构
[1] Raja Ramanna Ctr Adv Technol, Laser Mat Proc Div, Indore 452013, Madhya Pradesh, India
来源
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2010年 / 42卷 / 06期
关键词
ZnO; PLD; Thin film; TCO; LOW-TEMPERATURE GROWTH; VAPOR-DEPOSITION; TRANSPARENT; GAP; AL; SI; PHOTOLUMINESCENCE; LUMINESCENCE; TRANSITION; SCATTERING;
D O I
10.1016/j.physe.2010.02.005
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Transparent conductive dysprosium doped ZnO (Dy:ZnO) thin films with preferential orientation in the (0 0 0 2) direction were deposited on (0 0 0 1) sapphire substrate by buffer assisted pulsed laser deposition. The experimental results show that the resistivity of Dy:ZnO thin films decreased to a minimum value of similar to 7.6 x 10(-4) Omega cm with increasing Dy concentration up to similar to 0.45 at%, then increased with the further increase of Dy concentration. On the contrary, the band gap and carrier concentration of Dy:ZnO thin films initially increased, then decreased with increase of Dy concentration. The blue shift of band gap of Dy:ZnO thin films with increasing carrier concentration was attributed to the competing effects of Burstein-Moss shift and band gap narrowing. A bright room temperature photoluminescence observed at similar to 575 nm in all the Dy:ZnO thin films, with maximum intensity at similar to 0.45 at% of Dy doping, was attributed to be due to intra-band transitions of Dy3+ in ZnO. Near band edge photoluminescence of ZnO was observed at similar to 380 nm with photoluminescence intensity decreasing with increase of Dy concentration. Such Dy:ZnO thin films are found to be suitable candidate for luminescent device applications. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1838 / 1843
页数:6
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