共 43 条
- [1] About the influence of Line Edge Roughness on measured effective-CD [J]. OPTICS EXPRESS, 2011, 19 (21): : 19967 - 19972
- [2] Bronshtein I., 2007, Handbook of mathematics
- [3] HVM Metrology Challenges towards the 5 nm Node [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXX, 2016, 9778
- [7] Modeling the effect of line profile variation on optical critical dimension metrology - art. no. 65180Z [J]. Metrology, Inspection, and Process Control for Microlithography XXI, Pts 1-3, 2007, 6518 : Z5180 - Z5180
- [10] Investigations on a robust profile model for the reconstruction of 2D periodic absorber lines in scatterometry [J]. JOURNAL OF THE EUROPEAN OPTICAL SOCIETY-RAPID PUBLICATIONS, 2010, 5