Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings

被引:21
作者
Herrero, Analia Fernandez [1 ]
Pflueger, Mika [1 ]
Probst, Juergen [2 ]
Scholze, Frank [1 ]
Soltwisch, Victor [1 ]
机构
[1] PTB, Abbestr 2-12, D-10587 Berlin, Germany
[2] HZB, Albert Einstein Str 15, D-12489 Berlin, Germany
关键词
X-RAY-SCATTERING; DIFFUSE-SCATTERING; DIFFRACTION INTENSITIES; POLYMER GRATINGS; SIMULATION; PATTERNS; IMPACT;
D O I
10.1364/OE.27.032490
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Periodic nanostructures are fundamental elements in optical instrumentation as well as basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity of nanostructures have made roughness a limiting parameter to the performance. Grazing-incidence small-angle X-ray scattering is a characterization method that is sensitive to three-dimensional structures and their imperfections. To quantify line-edge roughness, a Debye-Waller factor (DWF), which is derived for binary gratings, is usually used. In this work, we systematically analyze the effect of roughness on the diffracted intensities. Two different limits to the application of the DWF are found depending on whether the roughness is normally distributed or not. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:32490 / 32507
页数:18
相关论文
共 43 条
  • [1] About the influence of Line Edge Roughness on measured effective-CD
    Bilski, Bartosz
    Frenner, Karsten
    Osten, Wolfgang
    [J]. OPTICS EXPRESS, 2011, 19 (21): : 19967 - 19972
  • [2] Bronshtein I., 2007, Handbook of mathematics
  • [3] HVM Metrology Challenges towards the 5 nm Node
    Bunday, Benjamin
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXX, 2016, 9778
  • [4] Investigations of the influence of common approximations in scatterometry for dimensional nanometrology
    Endres, J.
    Diener, A.
    Wurm, M.
    Bodermann, B.
    [J]. MEASUREMENT SCIENCE AND TECHNOLOGY, 2014, 25 (04)
  • [5] MULTILAYER GRATINGS EFFICIENCY - NUMERICAL AND PHYSICAL EXPERIMENTS
    ERKO, AI
    VIDAL, B
    VINCENT, P
    AGAFONOV, YA
    MARTYNOV, VV
    ROSCHUPKIN, DV
    BRUNEL, M
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1993, 333 (2-3) : 599 - 606
  • [6] emcee: The MCMC Hammer
    Foreman-Mackey, Daniel
    Hogg, David W.
    Lang, Dustin
    Goodman, Jonathan
    [J]. PUBLICATIONS OF THE ASTRONOMICAL SOCIETY OF THE PACIFIC, 2013, 125 (925) : 306 - 312
  • [7] Modeling the effect of line profile variation on optical critical dimension metrology - art. no. 65180Z
    Germer, Thomas A.
    [J]. Metrology, Inspection, and Process Control for Microlithography XXI, Pts 1-3, 2007, 6518 : Z5180 - Z5180
  • [8] Impact of different stochastic line edge roughness patterns on measurements in scatterometry - A simulation study
    Gross, H.
    Heidenreich, S.
    Baer, M.
    [J]. MEASUREMENT, 2017, 98 : 339 - 346
  • [9] Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry
    Gross, H.
    Henn, M. -A.
    Heidenreich, S.
    Rathsfeld, A.
    Baer, M.
    [J]. APPLIED OPTICS, 2012, 51 (30) : 7384 - 7394
  • [10] Investigations on a robust profile model for the reconstruction of 2D periodic absorber lines in scatterometry
    Gross, H.
    Richter, J.
    Rathsfeld, A.
    Baer, M.
    [J]. JOURNAL OF THE EUROPEAN OPTICAL SOCIETY-RAPID PUBLICATIONS, 2010, 5