Characteristics of SrBi2Ta2O9 ferroelectric films in an in situ applied low electric field prepared by metalorganic decomposition

被引:3
作者
Li, AD [1 ]
Ling, HQ
Wu, D
Yu, T
Liu, ZG
Ming, NB
机构
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Dept Mat Sci & Engn, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Natl Lab Solid State Microstruct, Dept Phys, Nanjing 210093, Peoples R China
[3] Nanjing Univ, Natl Lab Solid State Microstruct, Ctr Adv Studies Sci & Technol Microstruct, Nanjing 210093, Peoples R China
关键词
ferroelectrics; thin films; chemical synthesis;
D O I
10.1016/S0038-1098(02)00888-8
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
SrBi2Ta2O9 (SBT) films were prepared on Pt/TiO2/SiO2/Si substrates at 750degreesC in oxygen by metalorganic decomposition method. A low electric field was in situ applied during the film crystallization. It was first found that a low electric field and its direction have significant influence on the microstructures and ferroelectric properties of SBT films. Under a positive electric field (assuming that the bottom electrode is electrically grounded), the films show stronger c-axis-preferred orientation than without electric field and under a negative electric field. As a possible origin is proposed that the interface-induced nucleation growth between SBT and Pt coated substrate with application of low electric field plays a key role. Above all, an in situ applied low electric field during the film crystallization is a promising technique controlling film orientation for film preparation by wet chemical method. (C) 2003 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:469 / 473
页数:5
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