Two-dimensional confinement effects in gate-all-around (GAA) MOSFETS

被引:13
作者
Baie, X [1 ]
Colinge, JP [1 ]
机构
[1] Catholic Univ Louvain, DICE, B-1348 Louvain, Belgium
关键词
D O I
10.1016/S0038-1101(98)00061-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two-dimensional electron confinement effects have been modeled and experimentally observed in silicon-on-insulator (SOI) gate-all-around (GAA) MOSFETs. Solving the Poisson and Schrodinger equations in a self-consistent manner provides the electron wave functions and the energy levels within the device channel. The variation of these energy levels, as well as the electron concentration profile, have been computed as a function of gate voltage. Transconductance fluctuations are observed as new energy levels become populated. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:499 / 504
页数:6
相关论文
共 7 条
[1]   ELECTRONIC-PROPERTIES OF TWO-DIMENSIONAL SYSTEMS [J].
ANDO, T ;
FOWLER, AB ;
STERN, F .
REVIEWS OF MODERN PHYSICS, 1982, 54 (02) :437-672
[2]   DOUBLE-GATE SILICON-ON-INSULATOR TRANSISTOR WITH VOLUME INVERSION - A NEW DEVICE WITH GREATLY ENHANCED PERFORMANCE [J].
BALESTRA, F ;
CRISTOLOVEANU, S ;
BENACHIR, M ;
BRINI, J ;
ELEWA, T .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (09) :410-412
[3]  
BEENAKKER CWJ, 1991, SOLID STATE PHYS, V44, P1
[4]  
Colinge J. P., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P595, DOI 10.1109/IEDM.1990.237128
[5]   EVIDENCE OF 2-DIMENSIONAL CARRIER CONFINEMENT IN THIN N-CHANNEL SOI GATE-ALL-AROUND (GAA) DEVICES [J].
COLINGE, JP ;
BAIE, X ;
BAYOT, V .
IEEE ELECTRON DEVICE LETTERS, 1994, 15 (06) :193-195
[6]   MODELING OF ULTRATHIN DOUBLE-GATE NMOS/SOI TRANSISTORS [J].
FRANCIS, P ;
TERAO, A ;
FLANDRE, D ;
VANDEWIELE, F .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (05) :715-720
[7]   SELF-CONSISTENT QUANTUM-MECHANICAL CALCULATIONS IN ULTRATHIN SILICON-ON-INSULATOR STRUCTURES [J].
OUISSE, T .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (10) :5989-5995