Ag films on GaAs(110): dewetting and void growth

被引:9
作者
Evans, MMR
Han, BY
Weaver, JH [1 ]
机构
[1] Univ Minnesota, Dept Mat Sci & Chem Engn, Minneapolis, MN 55455 USA
[2] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
关键词
adhesion; crystallization; epitaxy; gallium arsenide; growth; scanning tunneling microscopy; silver; surface structure; morphology; roughness; and topography; wetting;
D O I
10.1016/S0039-6028(00)00673-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning tunneling microscopy studies show that atomically flat but slightly corrugated films of Ag(111) can be produced by depositing similar to 15 Angstrom of Ag on GaAs(110) at 40 K and then annealing at 300 K. These films are six layers thick. but they also contain voids that extend to the GaAs surface. Time-dependent imaging shows void growth due to spontaneous dewetting. Void growth is accompanied by the transfer of Ag atoms onto the terraces where elongated, single-height Ag islands formed, with patterns reflecting the corrugation of the Ag film. These results demonstrate that these films are thermodynamically unstable, and they reveal void growth and geometry for a multilayer film. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:90 / 96
页数:7
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