Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera

被引：6

作者：

Li, Yunpeng ^{[1
,2
]}

Zhang, Hongji ^{[1
]}

Wang, Haifeng ^{[1
]}

He, Fei ^{[1
]}

Wang, Xiaodong ^{[1
]}

Liu, Yang ^{[3
]}

Han, Suli ^{[1
,2
,4
]}

Zheng, Xin ^{[1
]}

Wang, Xiaoduo ^{[1
,2
]}

Chen, Bin ^{[1
]}

Li, Haibo ^{[3
]}

Chen, Bo ^{[1
]}

Cao, Jianlin ^{[1
]}

机构：

[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Peoples R China

[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China

[3] Jilin Normal Univ, Siping 136000, Peoples R China

[4] Bohai Drilling Engn Co Ltd, China Natl Petr Corp, Tianjin 300000, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2014年 / 317卷

关键词：

X-rays; Soft X-ray; Extreme ultraviolet (EUV); Multilayers; Thermal stability; Residual stress; FILMS; STABILITY;

D O I：

10.1016/j.apsusc.2014.08.188

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

To investigate the environmental adaptability of the Mo/Si multilayers on lunar surface, we studied the stability and stress of Mo/Si multilayers under the low and high temperature environment. The in-situ X-ray diffraction (XRD) and the ex-situ intrinsic stress are measured in the temperature range from - 135 degrees C to 600 degrees C and from 190 degrees C to 600 degrees C, respectively. The results demonstrate that the periodic structure of Mo/Si multilayers is stable between 135 degrees C and 300 degrees C. The stress is unaffected under low temperature and it gradually increases from 260 MPa to 1G MPa when the temperature changes from room temperature to 600 degrees C. Above 600 degrees C, large tensile stress leads to folds and cracks in the film. Thus, the large temperature range on lunar surface has little effect on the structure, performance and stress of the Mo/Si multilayers and the high temperature in lunar day releases the stress of the multilayer mirror. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：902 / 907

页数：6

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