The wettability of Y-Al-Si-O-N oxynitride glasses and its application in silicon nitride joining

被引:23
作者
Chen, J [1 ]
Wei, P [1 ]
Mei, Q [1 ]
Huang, Y [1 ]
机构
[1] Tsing Hua Univ, Dept Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
glass; interface; joining; oxynitride glass; Si3N4; wettability;
D O I
10.1016/S0955-2219(00)00115-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In the present work, first, the wettability of Y-Al-Si-O-N oxynitride glasses on Si3N4 substrates was investigated. It was found that the wettability of the glass depended on the ratios of Y2O3/Al2O3, i.e. when the ratio of Y2O3/Al2O3 increased, the wettability of corresponding glass on Si3N4 substrate improved. Based on the wettability work, Si3N4 ceramics can be successfully joined using glass with the best wettability. It was proved that a proper joining temperature is important for sound joints; a lower temperature would result in incomplete contact of the glass brazing layer with Si3N4 while a temperature higher than 1600 degrees would cause separation of Si3N4 joints by complete drainage of brazing glass into bulk Si3N4 ceramics. In the range of experiment time, to prolong brazing time is of benefit to the shear strength. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2685 / 2689
页数:5
相关论文
共 12 条
[1]  
BAIK S, 1987, J AM CERAM SOC, V70, pC105, DOI 10.1111/j.1151-2916.1987.tb05015.x
[2]   EFFECTS OF HEAT-TREATMENTS ON THE MICROSTRUCTURE OF A YTTRIA ALUMINA-DOPED HOT-PRESSED SI3N4 CERAMIC [J].
BODUR, CT ;
SZABO, DV ;
KROMP, K .
JOURNAL OF MATERIALS SCIENCE, 1993, 28 (08) :2089-2096
[3]  
BOSKOVIC S, 1990, J MATER SCI, V25, P1513
[4]  
DEBEDOE D, 1995, KEY ENG MATER, V100, P233
[5]  
DIEDRICH K, 1995, J AM CERAM SOC, V78, P1123
[6]   CRYSTALLIZATION OF THE GLASSY PHASE IN AN SI3N4 MATERIAL BY POST-SINTERING HEAT-TREATMENTS [J].
FALK, LKL ;
DUNLOP, GL .
JOURNAL OF MATERIALS SCIENCE, 1987, 22 (12) :4369-4376
[7]   Control of β-Si3N4 crystal morphology and its mechanism (Part 1) -: Effect of SiO2 and Y2O3 ratio [J].
Kitayama, M ;
Hirao, K ;
Toriyama, M ;
Kanzaki, S .
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1999, 107 (10) :930-934
[8]   GRAIN-GROWTH STUDIES OF SILICON-NITRIDE DISPERSED IN AN OXYNITRIDE GLASS [J].
KRAMER, M ;
HOFFMANN, MJ ;
PETZOW, G .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1993, 76 (11) :2778-2784
[9]   SILICON-NITRIDE JOINING [J].
MECARTNEY, ML ;
SINCLAIR, R ;
LOEHMAN, RE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1985, 68 (09) :472-478
[10]   FORMATION OF INTERFACIAL MICROSTRUCTURE IN BRAZING OF SI3N4 WITH TI-ACTIVATED AG-CU FILLER ALLOYS [J].
PAULASTO, M ;
KIVILAHTI, JK .
SCRIPTA METALLURGICA ET MATERIALIA, 1995, 32 (08) :1209-1214