Influence of annealing duration on optical property and surface morphology of ZnO thin film grown by atomic layer deposition

被引：23

作者：

Kim, C. R. ^{[1
]}

Shin, C. M. ^{[1
]}

Lee, J. Y. ^{[1
]}

Heo, J. H. ^{[1
]}

Lee, T. M. ^{[1
]}

Park, J. H. ^{[1
]}

Ryu, H. ^{[1
]}

Son, C. S. ^{[2
]}

Chang, J. H. ^{[3
]}

机构：

[1] Inje Univ, Dept Nano Syst Engn, Gimhae 621749, South Korea

[2] Silla Univ, Dept Elect Mat Engn, Pusan 617736, South Korea

[3] Korea Maritime Univ, Pusan 606791, South Korea

来源：

CURRENT APPLIED PHYSICS | 2010年 / 10卷

关键词：

Atomic layer deposition; Zinc oxide; Annealing; POSTANNEALING TREATMENT; SUBSTRATE-TEMPERATURE; PHOTOLUMINESCENCE; SAPPHIRE;

D O I：

10.1016/j.cap.2009.11.071

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO thin films were grown on p-Si (1 0 0) substrate by remote plasma atomic layer deposition (ALD) at 150 degrees C Post-growth annealing was carried out on the ZnO thin films at 800 degrees C in N-2 ambient for different annealing duration The optical property and surface morphology of annealed samples are improved significantly compared with as-grown ZnO thin film In particularly. the ZnO thin film that annealed for 10 mm has shown a great enhancement in near-band-edge emission in photoluminescence The effect of the annealing treatment on the optical property and surface morphology of ZnO thin films were investigated by photoluminescence, atomic force microscopy and scanning electron microscopy (C) 2009 Elsevier B.V. All rights reserved

引用

页码：S294 / S297

页数：4

共 26 条

[1]

ABDULLAH M, 2001, J APPL PHYS, V89, P6431

[2] Optical properties of ZnO nanostructures [J].

Djurisic, Aleksandra B. ;

Leung, Yu Hang .

SMALL, 2006, 2 (8-9) :944-961

[3] Influence of annealing on ZnO thin film grown by plasma-assisted MOCVD [J].

Du, GT ;

Wang, JZ ;

Wang, XQ ;

Jiang, XY ;

Yang, SR ;

Ma, Y ;

Yan, W ;

Gao, DS ;

Liu, X ;

Cao, H ;

Xu, JY ;

Chang, RPH .

VACUUM, 2003, 69 (04) :473-476

[4] Influence of post-annealing treatment on the structure properties of ZnO films [J].

Fang, ZB ;

Yan, ZJ ;

Tan, YS ;

Liu, XQ ;

Wang, YY .

APPLIED SURFACE SCIENCE, 2005, 241 (3-4) :303-308

[5] Pure and Sn-doped ZnO films produced by pulsed laser deposition [J].

Holmelund, E ;

Schou, J ;

Tougaard, S ;

Larsen, NB .

APPLIED SURFACE SCIENCE, 2002, 197 :467-471

[6] Influence of different post-treatments on the structure and optical properties of zinc oxide thin films [J].

Hong, RJ ;

Huang, JB ;

He, HB ;

Fan, ZX ;

Shao, JD .

APPLIED SURFACE SCIENCE, 2005, 242 (3-4) :346-352

[7] Structural and optical properties of ZnO films with different thicknesses grown on sapphire by MOCVD [J].

Hou Chang-min ;

Huang Ke-ke ;

Gao Zhong-min ;

Li Xiang-shan ;

Feng Shou-hua ;

Zhang Yuan-tao ;

Du Guo-tong .

CHEMICAL RESEARCH IN CHINESE UNIVERSITIES, 2006, 22 (05) :552-555

[8] Investigation of the annealing effects on the structural and optical properties of sputtered ZnO thin films [J].

Jung, M ;

Lee, J ;

Park, S ;

Kim, H ;

Chang, JH .

JOURNAL OF CRYSTAL GROWTH, 2005, 283 (3-4) :384-389

[9] The grain size effects on the photoluminescence of ZnO/α-Al2O3 grown by radio-frequency magnetron sputtering [J].

Kim, KK ;

Song, JH ;

Jung, HJ ;

Choi, WK ;

Park, SJ ;

Song, JH .

JOURNAL OF APPLIED PHYSICS, 2000, 87 (07) :3573-3575

[10] Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant [J].

Kim, SK ;

Hwang, CS ;

Park, SHK ;

Yun, SJ .

THIN SOLID FILMS, 2005, 478 (1-2) :103-108

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