A codoping method in GaN proposed by ab initio electronic-structure calculations

被引:14
作者
Yamamoto, T
Katayama-Yoshida, H
机构
[1] Osaka Univ, ISIR, Dept Condensed Matter Phys, Osaka 567, Japan
[2] Asahi Chem Ind Co Ltd, Dept Comp Sci, Fuji, Shizuoka 416, Japan
[3] Japan Sci & Technol Corp, PRESTO, Kawaguchi, Saitama 332, Japan
来源
DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3 | 1997年 / 258-2卷
关键词
GaN; self-compensation; wide-band-gap semiconductors; electronic-band structures; the Madelung energy; a codoping method; FILMS;
D O I
10.4028/www.scientific.net/MSF.258-263.1185
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We propose a new type doping method, the "codoping method (doping n- and p-type dopants at the same time)" for the fabrication of high-conductivity p-type GaN with a wurtzite structure. Ab initio electronic-structure calculations predict that the co-incorporation of Be-Ga with O-N or Si-Ga in codoped p-type GaN produces high Be concentrations with stable ionic charge distributions markedly due to a decrease in the Madelung energy in contrast to p-type GaN doped with only Be.
引用
收藏
页码:1185 / 1190
页数:6
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