Extremely low-noise avalanche photodiodes based on AlAs0.56Sb0.44

被引:1
作者
Yi, Xin [1 ,4 ]
Xie, Shiyu [2 ]
Liang, Baolai [3 ]
Lim, Leh W. [1 ]
Huffaker, Diana L. [3 ]
Tan, Chee H. [1 ]
David, John P. R. [1 ]
机构
[1] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
[2] Cardiff Univ, Sch Phys & Astron, Cardiff CF24 3AA, Wales
[3] Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA USA
[4] Heriot Watt Univ, Sch Engn & Phys Sci, Inst Photon & Quantum Sci, Edinburgh, Midlothian, Scotland
来源
EMERGING IMAGING AND SENSING TECHNOLOGIES FOR SECURITY AND DEFENCE V; AND ADVANCED MANUFACTURING TECHNOLOGIES FOR MICRO- AND NANOSYSTEMS IN SECURITY AND DEFENCE III | 2020年 / 11540卷
基金
美国国家科学基金会;
关键词
Impact ionization; Avalanche photodiode; Avalanche multiplication; AlAsSb; IMPACT IONIZATION COEFFICIENTS; LOW EXCESS NOISE; MULTIPLICATION; ELECTRON; SILICON; RATES;
D O I
10.1117/12.2573766
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
This paper presents the electron and hole avalanche multiplication and excess noise characteristics based on bulk AlAs0.56Sb0.44 p-i-n and n-i-p homojunction diodes lattice matched to InP, with nominal avalanche region thicknesses of 0.6 -1.5 mu m. From these, the bulk electron and hole impact ionization coefficients (alpha and beta respectively), have been determined over an electric field range of 220-1250 kV/cm for alpha and from 360- 1250 kV/cm for beta for the first time. Excess noise characteristics suggest an beta/alpha ratio as low as 0.005 for an avalanche region of 1.5 mu m in this material, close to the theoretical minimum and significantly lower than AlInAs, InP, or even silicon. This material can be easily integrated with InGaAs for networking and sensing applications, with modeling suggesting that a sensitivity of -32.1 dBm at a bit-error rate (BER) of 1x10(-12) at 10 Gb/s at 1550 nm can be realized. This sensitivity can be improved even further by optimizing the dark currents and by using a lower noise transimpedance amplifier.
引用
收藏
页数:10
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