Tailoring the surface morphology of carbon nanotube forests by plasma etching: A parametric study

被引：18

作者：

Seo, Seungju ^{[1
]}

Kim, Sanha ^{[2
,3
]}

Yamamoto, Shun ^{[1
]}

Cui, Kehang ^{[2
,4
]}

Kodama, Takashi ^{[1
]}

Shiomi, Junichiro ^{[1
]}

Inoue, Taiki ^{[1
,5
]}

Chiashi, Shohei ^{[1
]}

Maruyama, Shigeo ^{[1
]}

Hart, A. John ^{[2
]}

机构：

[1] Univ Tokyo, Dept Mech Engn, Tokyo 1138656, Japan

[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA

[3] Korea Adv Inst Sci & Technol, Dept Mech Engn, Daejeon 34141, South Korea

[4] Shanghai Jiao Tong Univ, Dept Mat Sci & Engn, Shanghai 200240, Peoples R China

[5] Osaka Univ, Grad Sch Engn, Dept Appl Phys, Osaka 5650871, Japan

来源：

CARBON | 2021年 / 180卷 / 180期

基金：

美国国家科学基金会;

关键词：

Carbon nanotube; Plasma treatment; Etching; Roughness; Surface modification; GLOBAL-MODEL; DENSITY; GROWTH; FUNCTIONALIZATION; PURIFICATION; ALIGNMENT; FILM; AR;

D O I：

10.1016/j.carbon.2021.04.066

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The top surface of carbon nanotube (CNT) "forests" produced by thermal chemical vapor deposition (CVD) often has a tangled morphology, owing to the self-organization of the CNTs at the initial stage of the CVD process. Removal of this top "crust" layer, without damaging the intrinsic microstructure of the CNT forest is often a key step for further applications. This paper studies the tailored use of Ar/O-2 plasma etching to modify the surface morphology of multi-walled CNT forests. First, we investigate the effects of process parameters including plasma power, flow rate, and gas composition on the etching of CNT forests. As a result, we identify the plasma conditions that successfully remove the top crust yet maintain the structural shape of a CNT forest. Second, we prepare CNT forests having different packing densities and heights to study the influence of the initial characteristics on the etching result. We experimentally confirm that the etching rate depends strongly on the density and morphology of the crust layer. We also compare the material removal rate in vertical and lateral directions. Finally, we explore the enhancement of alignment and chemical uniformity of the top surface of CNT forests by the Ar/O2 plasma (C) 2021 Elsevier Ltd. All rights reserved.

引用

页码：204 / 214

页数：11

共 61 条

[1] Carbon Dioxide Plasma as a Versatile Medium for Purification and Functionalization of Vertically Aligned Carbon Nanotubes [J].