Studies on the electrodeposition of CdS films

被引：14
作者：
Lade, SJ [1 ]
Uplane, MD [1 ]
Lokhande, CD [1 ]
机构：
[1] Shivaji Univ, Dept Phys, Thin Film Lab, Kolhapur 416004, Maharashtra, India
来源：
MATERIALS CHEMISTRY AND PHYSICS | 1998年 / 53卷 / 03期
关键词：
electrodeposition; thin films;
D O I：
10.1016/S0254-0584(97)02071-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of Cds have been electrodeposited from an acidic bath using CdSO4, Na2S2O3 and EDTA at pH 5 to 6 on to the stainless steel and fluorine-tin oxide (FTO) coated glass substrates. The structural, optical and photoelectrochemical properties of these films have been studied. An X-ray diffraction study revealed that CdS films deposited at 70 degrees C are polycrystalline with a single hexagonal phase. The optical absorption studies showed that the bandgap of CdS is 2.42 eV. In order to increase the conductivity, the as-deposited films were annealed in a nitrogen atmosphere. CdS films deposited on to stainless steel substsates showed better I-sc and V-oc as compared to FTO coated glass substrates. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：239 / 242
页数：4
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