Redistribution of Supported Vanadium Oxide Catalysts by Pattern Formation

被引：8

作者：

Lovis, Florian ^{[1
]}

Hesse, Martin ^{[1
]}

Imbihl, Ronald ^{[1
]}

机构：

[1] Leibniz Univ Hannover, Inst Phys Chem & Elektrochem, D-30167 Hannover, Germany

来源：

CATALYSIS LETTERS | 2010年 / 136卷 / 3-4期

关键词：

Vanadium oxide; Rhodium; H-2 + O-2 reaction; Stationary pattern; Reactive phase separation; Photoelectron emission microscopy; SURFACE; METAL; NANOSTRUCTURES; ADSORPTION; PARTICLES; RH(111); FILMS;

D O I：

10.1007/s10562-010-0320-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The behavior of ultra- thin (<1 ML) films of vanadium oxide on Rh( 111) during the H-2 + O-2 reaction was studied in the 10(-6)-10(-4) mbar range with photoemission electron microscopy (PEEM). One observes that under reaction conditions the V-oxide condenses forming a stripe pattern of macroscopic dimensions on the surface. The pattern is characterized by an intrinsic wave length which obeys a power law dependence on the reactants pressure. The origin of the pattern is discussed within the concept of reactive phase separation, i.e. the strongly attractive interactions between V and O and/or changes in the interfacial energies caused by reduction are presumably the main driving forces for condensation.

引用

页码：171 / 176

页数：6

共 25 条

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