A Cost-Effective Fault Tolerance Technique for Functional TSV in 3-D ICs

被引:21
|
作者
Reddy, Raviteja P. [1 ]
Acharyya, Amit [1 ]
Khursheed, Saqib [2 ]
机构
[1] IIT Hyderabad, Dept Elect Engn, Hyderabad 502285, Andhra Prades, India
[2] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3BX, Merseyside, England
关键词
3-D IC; fault tolerance; through-silicon via (TSV); time division multiplexing access (TDMA); yield; RESISTIVE OPEN; OPEN DEFECTS; DELAY TEST; DESIGN;
D O I
10.1109/TVLSI.2017.2681703
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Regular and redundant through-silicon via (TSV) interconnects are used in fault tolerance techniques of 3-D IC. However, the fabrication process of TSVs results in defects that reduce the yield and reliability of TSVs. On the other hand, each TSV is associated with a significant amount of on-chip area overhead. Therefore, unlike the state-of-the-art fault tolerance architectures, here we propose the time division multiplexing access (TDMA)-based fault tolerance technique without using any redundant TSVs, which reduces the area overhead and enhances the yield. In the proposed technique, by means of TDMA, we reroute the signal through defect-free TSV. Subsequently, an architecture based on the proposed technique has been designed, evaluated, and validated on logic-on-logic 3-D IWLS'05 benchmark circuits using 130-nm technology node. The proposed technique is found to reduce the area overhead by 28.70%-40.60%, compared to the state-of-the-art architectures and results in a yield of 98.9%-99.8%.
引用
收藏
页码:2071 / 2080
页数:10
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