Focussed ion beam fabrication of large and complex nanopatterns

被引：0

作者：

Wilhelmi, O. ^{[1
]}

Roussel, L. ^{[1
]}

Faber, P. ^{[1
]}

Reyntjens, S. ^{[1
]}

Daniel, G. ^{[1
]}

机构：

[1] FEI Co, NL-5600 KA Eindhoven, Netherlands

来源：

JOURNAL OF EXPERIMENTAL NANOSCIENCE | 2010年 / 5卷 / 03期

关键词：

DualBeam; nanopatterning; nanoprototyping; nanofabrication; FIB;

D O I：

10.1080/17458080903487448

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The fabrication of nanopatterns with a focussed ion beam (FIB) has recently been expanded to more complex nanopatterns with large numbers of individual pattern elements and covering larger pattern areas. We present two examples of FIB-fabricated large and complex nanopatterns and describe the key aspects of the underlying process automation. The FIB-fabrication has been carried out on DualBeam instruments, which combine the FIB with a scanning electron microscope in one single instrument. We also present examples on how FIB-cross-sectioning and high-resolution electron microscopy can be applied to characterise the just fabricated nanopatterns in great detail.

引用

页码：244 / 250

页数：7

共 3 条

[1] Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals [J].