Photon-sieve lithography

被引：110

作者：

Menon, R

Gil, D

Barbastathis, G

Smith, HI

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA

[3] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 2005年 / 22卷 / 02期

关键词：

D O I：

10.1364/JOSAA.22.000342

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency. (C) 2005 Optical Society of America.

引用

页码：342 / 345

页数：4

共 8 条

[1] Nonparaxial model for the focusing of high-numerical-aperture photon sieves [J].