Failure Analysis and Performance Improvement of Phase Change Memory Based on Ge2Sb2Te5

被引:5
作者
Wang, Yuchan [1 ]
Yuan, Yiming [1 ]
Wang, Yuhan [2 ]
Yuan, Suzhen [1 ]
Chen, Xiaogang [3 ,4 ]
机构
[1] Chongqing Univ Posts & Telecommun, Dept Optoelect Engn, Chongqing 400065, Peoples R China
[2] Chongqing Univ Technol, Sch Elect & Elect Engn, Chongqing 400054, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[4] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
Phase change memory (PCM); Ge2Sb2Te5; RESET stuck; incomplete crystallization;
D O I
10.1109/TDMR.2021.3065217
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As the operating conditions are getting harsher, the failure analysis of Phase Change Memory (PCM) are getting more and more important. In this work, some nonvolatile Phase Change Memory (PCM) devices based on Ge2Sb2Te5 are found RESET stuck failure during the pulsed mode switching. The causes, which result in the early failure of the PCM, have been studied by combining transmission electron microscopy (TEM), the two-dimensional finite analysis and energy dispersive X-ray spectroscopy (EDS). Compared with the typical devices, the incomplete crystallization in the inactive region of the abnormal devices are found based on the TEM images and corresponding fast Fourier transform (FFT) patterns, which is taken as the one of the major reasons for the SET failure confirmed by the simulation data. On the other hand, the element analysis was also carried out. Based on the EDS results, segregation of Te is considered to be another cause of the failure. To optimize performances of the RESET stuck devices, a DC initialization method is used. The resistance distributions of PCM cells before and after the DC initialization are presented, which shows a significant improvement in cells SET performance.
引用
收藏
页码:236 / 239
页数:4
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