Spontaneous Passivation of Hybrid Perovskite by Sodium Ions from Glass Substrates: Mysterious Enhancement of Device Efficiency Revealed
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作者:
Bi, Cheng
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Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Bi, Cheng
[1
,2
]
Zheng, Xiaopeng
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Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Zheng, Xiaopeng
[1
,2
]
Chen, Bo
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机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Chen, Bo
[1
,2
]
Wei, Haotong
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Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Wei, Haotong
[1
,2
]
Huang, Jinsong
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机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
Univ N Carolina, Dept Appl Phys Sci, Chapel Hill, NC 27599 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Huang, Jinsong
[1
,2
,3
]
机构:
[1] Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
[2] Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
[3] Univ N Carolina, Dept Appl Phys Sci, Chapel Hill, NC 27599 USA
The efficiency of a solar cell generally decreases over time due to degradation of the devices. Here we report a spontaneous increase of device efficiency for organic inorganic hybrid perovskite (OIHP) solar cells after a period of storage that is speculated to be related to the sodium ions (Na+) diffused from the substrate. The efficiency of a p-i-n planar heterojunction structure device rises from 18.8 to 20.2% after 24 h of storage in nitrogen. The increased efficiency can be explained by the prolonged carrier lifetime and reduced trap density in the OIHP films. The expected contribution by N+ in defect passivation has been evidenced by studying the evolution of the film's photoluminescence (PL) lifetime, trap density, and device efficiency over storage duration on varied substrates that either contain Nat or do not. The passivation effect of N+ is further identified by the improved PL lifetime observed in the OIHP film made on a silicon substrate with intentionally added Na+.
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页码:1400 / 1406
页数:7
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[11]
Colella S, 2014, J PHYS CHEM LETT, V5, P3532, DOI [10.1021/jz501869F, 10.1021/jz501869f]
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Deng, Yehao
;
Dong, Qingfeng
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Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Dong, Qingfeng
;
Bi, Cheng
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Bi, Cheng
;
Yuan, Yongbo
论文数: 0引用数: 0
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机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Yuan, Yongbo
;
Huang, Jinsong
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
机构:
Chinese Univ Hong Kong, Dept Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Groningen, Zernike Inst Adv Mat, Nijenborgh 4, NL-9747 AG Groningen, Netherlands
机构:
Chinese Univ Hong Kong, Dept Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Groningen, Zernike Inst Adv Mat, Nijenborgh 4, NL-9747 AG Groningen, Netherlands
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Deng, Yehao
;
Dong, Qingfeng
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Dong, Qingfeng
;
Bi, Cheng
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Bi, Cheng
;
Yuan, Yongbo
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Yuan, Yongbo
;
Huang, Jinsong
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAUniv Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
机构:
Chinese Univ Hong Kong, Dept Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Groningen, Zernike Inst Adv Mat, Nijenborgh 4, NL-9747 AG Groningen, Netherlands
机构:
Chinese Univ Hong Kong, Dept Elect Engn, Hong Kong, Hong Kong, Peoples R ChinaUniv Groningen, Zernike Inst Adv Mat, Nijenborgh 4, NL-9747 AG Groningen, Netherlands