Large positive and negative lateral displacements from total internal reflection configuration with a weakly absorbing dielectric film

被引:0
|
作者
Ding Fang-Gang [1 ]
Chen Xi
Li Chun-Fang
机构
[1] Shanghai Univ, Dept Phys, Shanghai 200444, Peoples R China
[2] Chinese Acad Sci, State Key Lab Transient Opt & Photon, Xian Inst Opt & Precis Mech, Xian 710119, Peoples R China
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
It is theoretically shown that the simultaneously large positive and negative lateral displacements will appear when the resonant condition is satisfied for a TE-polarized light beam reflected from the total internal reflection configuration with a weakly absorbing dielectric film. Appearance of the enhanced negative lateral displacement is relative to the incidence angle, absorption of the thin Elm and its thickness. If we select an appropriate weakly absorbing dielectric film and its thickness, the simultaneously enhanced positive and negative lateral displacements will appear at different resonant angles. These phenomena may lead to convenient measurements and interesting applications in optical devices.
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页码:1926 / 1929
页数:4
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