In situ gravimetric monitoring of decomposition rate on the surface of (0001) c-plane sapphire for the high temperature growth of AlN

被引:28
|
作者
Akiyama, K. [1 ]
Araki, T. [1 ]
Murakami, H. [1 ]
Kumagai, Y. [1 ]
Koukitu, A. [1 ]
机构
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, 2-24-16 Naka Cho, Tokyo 1848588, Japan
关键词
D O I
10.1002/pssc.200674816
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The thermal stability of (0001) sapphire was investigated at atmospheric pressure using the in situ gravimetric monitoring (GM) method. The weight change of a sapphire substrate was monitored at various hydrogen partial pressures in carrier gas (PH2) at temperatures over 1200 degrees C. Although the sapphire substrate was stable up to 1450 degrees C in an inert carrier gas (PH2 = 0.0 atm), sapphire decomposition started to occur at 1200 degrees C in H-2 carrier gas (PH2 = 1.0 atm). Moreover the activation energy and order of reaction for sapphire surface decomposition changed at approximately 1300 degrees C. These results indicate that the rate-limiting reaction for sapphire decomposition shifts near 1300 degrees C. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2297 / +
页数:2
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