Effect of oxygen partial pressure on the structural and optical properties of sputter deposited ZnO nanocrystalline thin films

被引：52

作者：

Singh, Preetam

Chawla, Amit Kumar

Kaur, Davinder

Chandra, Ramesh ^{[1
]}

机构：

[1] Indian Inst Technol, Nano Sci Lab, Inst Instrumentat Ctr, Roorkee 247667, Uttar Pradesh, India

[2] Indian Inst Technol, Dept Phys, Funct Nanomat Lab, Roorkee 247667, Uttar Pradesh, India

来源：

MATERIALS LETTERS | 2007年 / 61卷 / 10期

关键词：

nanocrystalline thin films; sputtering; X-ray diffraction;

D O I：

10.1016/j.matlet.2006.08.013

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the influence of deposition parameters such as oxygen partial pressure and overall sputtering pressure on the structural and optical properties of the as-grown ZnO nanocrystalline thin films. The films were prepared by dc magnetron sputtering using Zn metal target under two different argon and oxygen ratios at various sputtering pressures. Microstructure of the films was investigated using X-ray diffraction and scanning electron microscopy. Optical properties of the films were examined using UV-Visible spectrophotometer. The results show that the films deposited at low oxygen partial pressure (10%) contain mixed phase (Zn and ZnO) and are randomly oriented while the films deposited at higher oxygen partial pressure (30%) are single phase (ZnO) and highly oriented along the c-axis. We found that the oxygen partial pressure and the sputtering pressure are complementary to each other. The optical band gap calculated from Tauc's relation and the particle size calculation were in agreement with each other. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：2050 / 2053

页数：4

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