Selective metallization of cured SU-8 microstructures using electroless plating method

被引:22
作者
Dai, Wen [1 ]
Wang, Wanjun [1 ]
机构
[1] Louisiana State Univ, Dept Mech Engn, Baton Rouge, LA 70803 USA
基金
美国国家科学基金会;
关键词
UV lithography; electroless plating; metallization; selective; SU-8; microstructures;
D O I
10.1016/j.sna.2006.07.015
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we report a research work on the fabrication and selective metallization of high aspect ratio cured SU-8 polymer microstructures on silicon substrate using UV lithography technology and selective electroless plating method. Electroless plating of metal films on both the top and sidewall surfaces of microstructures was achieved while the silicon substrate was not coated. The details of the successfully developed procedures are presented, including the surface modification of cured SU-8 microstructures and the electroless plating of gold and copper. The surface modification was realized through attaching Au colloidal film to amine group, that forms a seed layer on cured SU-8 polymer for electroless plating of copper after the polymer surfaces were exposed under large UV irradiation. Experiments demonstrated that UV exposure dosage and illumination direction are two of the most dominant parameters in the selective electroless plating process. The approach can also be easily adapted to electroplating other metals with different electroless plating baths in theory. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:300 / 307
页数:8
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