A modification to the Sigmund model of ion sputtering

被引：20

作者：

Bradley, R. Mark ^{[1
]}

Hofsaess, Hans ^{[2
]}

机构：

[1] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA

[2] Univ Gottingen, Inst Phys 2, D-37077 Gottingen, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2014年 / 116卷 / 23期

基金：

美国国家科学基金会;

关键词：

SURFACES; BOMBARDMENT;

D O I：

10.1063/1.4904438

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We modify the Sigmund model of ion sputtering so that the distribution of deposited energy is in better accord with the results of molecular dynamics simulations. For a flat target surface, the model gives a sputter yield that displays a maximum as the angle of ion incidence is increased, as observed experimentally. The model also predicts that for sufficiently high angles of incidence, the curvature dependence of the crater function tends to destabilize the solid surface. (C) 2014 AIP Publishing LLC.

引用

页数：7

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