Simulation of antireflective subwavelength grating structures for optical device applications

被引：0

作者：

Song, Y. M. ^{[1
]}

Lee, Y. T. ^{[1
]}

机构：

[1] Gwangju Inst Sci & Technol, Dept Informat & Commun, 1 Oryong Dong, Kwangju 500712, South Korea

来源：

NUSOD 2009: 9TH INTERNATIONAL CONFERENCE ON NUMERICAL SIMULATION OF OPTOELECTRONIC DEVICES, PROCEEDINGS | 2009年

关键词：

FABRICATION; SILICON;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Diffraction efficiencies of three different types of subwavelength grating (SWG) structures were simulated for optoelectronic device applications using rigorous coupled wave analysis method. The effect of height and period of SWG structures on the reflectance were investigated. Also, the internal and external reflection from the SWG structures were simulated and analyzed.

引用

页码：103 / +

页数：2

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