First-principles study for molecular beam epitaxial growth of GaN(0001)

被引:15
作者
Ishii, A [1 ]
机构
[1] Tottori Univ, Dept Appl Math & Phys, Tottori 6808552, Japan
[2] Natl Inst Adv Ind Sci & Technol, AIST, Tsukuba, Ibaraki, Japan
关键词
molecular beam epitaxy; epitaxial growth; metal organic vapor phase epitaxy;
D O I
10.1016/S0169-4332(03)00393-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Epitaxial growth of GaN(0 0 0 1) is possible even using molecular beam epitaxy (MBE). Under the N-rich condition, nitrogen adatom on GaN(0 0 0 1) truncated surface adsorbed at an abnormal site, H3-site which is not the original site for wurtzite structure nor zincblende structure. The nitrogen at the H3-site is very stable and inactive so that the epitaxial growth is prevented. The first-principles calculation shows us that the Ga-rich condition is very helpful to assist epitaxial growth of GaN(0 0 0 1). (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:447 / 452
页数:6
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