The impact of wafering on organic and inorganic surface contaminations

被引:1
作者
Meyer, S. [1 ]
Wahl, S. [1 ]
Timmel, S. [1 ]
Koepge, R. [1 ]
Jang, B. -Y. [2 ]
机构
[1] Fraunhofer Ctr Silicon Photovolta CSP, Otto Eissfeld Str 12, D-06120 Halle, Saale, Germany
[2] Korea Inst Energy Res, 71-2 Jang Dong, Daejeon, South Korea
关键词
Wafer surface; Organic and inorganic impurities; Quantitative determination;
D O I
10.1016/j.apsusc.2016.03.227
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Beside the silicon feedstock material, the crystallization process and the cell processing itself, the wafer sawing process can strongly determine the final solar cell quality. Especially surface contamination is introduced in this process step because impurities from sawing meet with a virgin silicon surface which is highly reactive until the oxide layer is formed. In this paper we quantitatively analysed both, the organic and inorganic contamination on wafer surfaces and show that changes of process parameters during wafering may cause dramatic changes in surface purity. We present powerful techniques for the monitoring of wafer surface quality which is essential for the production of high efficiency and high quality solar cells. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:384 / 387
页数:4
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