Dealing with interference challenge in the electrochemical detection of As(III) -A complexometric masking approach

被引:31
作者
Idris, A. O. [1 ]
Mafa, J. P. [1 ]
Mabuba, N. [1 ]
Arotiba, O. A. [1 ,2 ]
机构
[1] Univ Johannesburg, Dept Appl Chem, POB 17011, ZA-2028 Johannesburg, South Africa
[2] Univ Johannesburg, Ctr Nanomat Sci Res, ZA-2028 Johannesburg, South Africa
基金
新加坡国家研究基金会;
关键词
Arsenic (III) ion; Copper (II) ion; Interference; Complexometric masking; Square wave anodic stripping voltammetry; ANODIC-STRIPPING VOLTAMMETRY; GLASSY-CARBON ELECTRODE; GOLD NANOPARTICLES; ARSENIC(III); WATER; ELECTROANALYSIS; NANOTUBES;
D O I
10.1016/j.elecom.2016.01.003
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Copper ion has been reported to be a major interference in the electrochemical detection of arsenic (III) ion in water. Therefore the development of a simple approach to alleviate this interference challenge is important. We present the use of ammonia solution as a masking agent for Cu(II) interference in the square wave anodic stripping voltammetry of As(III) on a gold nanoparticle modified glassy carbon electrode (GCE). AuNPs were electrochemically deposited by cyclic voltammetry on a GCE from a potential range of -400 mV to 1100 mV for 10 cycles. Square wave anodic stripping voltammetry (SWASV) was used to detect As(III) in water with and without Cu(II) based on the following optimised conditions: pH = 3, deposition potential = -600 mV, and deposition time = 60 s. Ammonia solution was added to the analyte solution and the effect on mitigating copper interference was studied. The presence of ammonia complexed the Cu(II) ion thereby excluding Cu(II) from interfering with the As(III) signal. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:18 / 20
页数:3
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