Recent progress in plasma nitriding

被引:33
作者
Musil, J [1 ]
Vlcek, J [1 ]
Ruzicka, M [1 ]
机构
[1] Univ W Bohemia, Dept Phys, Plzen 30614, Czech Republic
关键词
plasma nitriding; enhanced nitriding discharge; duplex treatments; low-pressure nitriding;
D O I
10.1016/S0042-207X(00)00404-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The paper reports on a new system for plasma nitriding combined with a hollow cathode discharge sputtering at high pressures (about 1000 Pa), a new way of producing duplex coatings, and on a low-pressure (0.1-0.3 Pa) plasma nitriding using microwave discharges. It has been shown that an addition of an auxiliary cathode into a conventional high-pressure nitriding system can improve properties of the nitrided surfaces by incorporation of the elements sputtered from the auxiliary cathode. a converse duplex coating technique consisting of plasma nitriding or vacuum heat treatment of pre-coated substrates has been successfully tested for the protection of aluminium. It has been shown that a low-alloy steel nitriding can be effective not only inside the low-pressure electron cyclotron resonance discharges, i.e. for a standard distance of the substrate from an output of the plasma source, d = 250 mm, but also outside these discharges, i.e. for a large distance d = 750 mm. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:940 / 951
页数:12
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