Optical and electrical properties of TiOx thin films deposited by electron beam evaporation

被引：53
|
作者：
Yao, Hanke [1 ]
Shao, Handa [1 ]
He, Hongbo [1 ]
Fan, Zhengxiu [1 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, R&D Ctr Opt Thin Film Coatings, Shanghai 201800, Peoples R China
来源：
VACUUM | 2007年 / 81卷 / 09期
关键词：
titanium monoxide; electron beam evaporation; Tio(x) thin film; X-ray photoelectron spectroscopy;
D O I：
10.1016/j.vacuum.2006.11.002
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The TiOx thin films were prepared by electron beam evaporation using TiO as the starting material. The effect of the annealing temperature on the optical and electrical properties was investigated. The spectra of X-ray photoelectron spectroscopy reveal that Ti in the films mainly exist in the forms of Ti2+ and Ti3+ below 400 degrees C 24h annealing. The charge transfer between different titanium ion contribute greatly to the color, absorption, and electrical resistance of the films. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码：1023 / 1028
页数：6
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