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An Analytical Method for Parameter Extraction in Oxide Semiconductor Field-Effect Transistors
被引:2
作者:
Chien, Yu-Chieh
[1
]
Londono-Ramirez, Horacio
[2
,3
]
Kuo, Chuan-Wei
[4
]
Tsao, Yu-Ching
[5
]
Nag, Manoj
[2
]
Chang, Ting-Chang
[5
]
Ang, Kah-Wee
[1
,6
]
机构:
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117583, Singapore
[2] IMEC, B-3001 Leuven, Belgium
[3] Katholieke Univ Leuven, Dept Neurosci, B-3000 Leuven, Belgium
[4] Natl Sun Yat Sen Univ, Dept Mat & Optoelect, Kaohsiung 80424, Taiwan
[5] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[6] ASTAR, Inst Mat Res & Engn, Singapore 138634, Singapore
基金:
新加坡国家研究基金会;
关键词:
Field effect transistors;
Iron;
Parameter extraction;
Logic gates;
Semiconductor device measurement;
Threshold voltage;
Semiconductor device modeling;
Contact resistance;
effective channel length;
field effect mobility;
parameter extraction;
threshold voltage;
THIN-FILM TRANSISTORS;
THRESHOLD VOLTAGE;
SERIES RESISTANCE;
MOBILITY;
CRYSTALLINE;
MODEL;
D O I:
10.1109/TED.2021.3072878
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
This article presents an analytical method for parameter extraction in oxide semiconductor field-effect transistors (OS FETs), including threshold voltage (V-T), effective channel length (L-eff), source-drain series resistance (R-SD), and intrinsic effective mobility (mu(int)). An analytical expression of effective mobility (mu(eff)) is implemented with the consideration of percolation conduction and R-SD effects. This method relies on the concept of Y-function method and the channel length dependent measurement. The extraction results are compared to those from the combination of transfer length method (TLM). It has been shown that a better accuracy of the extracted parameters is achieved with the proposed method. Furthermore, transfer characteristics are resimulated based on the extracted parameters, in which a good match between measurement and simulation is obtained.
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页码:2717 / 2722
页数:6
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