An Analytical Method for Parameter Extraction in Oxide Semiconductor Field-Effect Transistors

被引:2
作者
Chien, Yu-Chieh [1 ]
Londono-Ramirez, Horacio [2 ,3 ]
Kuo, Chuan-Wei [4 ]
Tsao, Yu-Ching [5 ]
Nag, Manoj [2 ]
Chang, Ting-Chang [5 ]
Ang, Kah-Wee [1 ,6 ]
机构
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117583, Singapore
[2] IMEC, B-3001 Leuven, Belgium
[3] Katholieke Univ Leuven, Dept Neurosci, B-3000 Leuven, Belgium
[4] Natl Sun Yat Sen Univ, Dept Mat & Optoelect, Kaohsiung 80424, Taiwan
[5] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[6] ASTAR, Inst Mat Res & Engn, Singapore 138634, Singapore
基金
新加坡国家研究基金会;
关键词
Field effect transistors; Iron; Parameter extraction; Logic gates; Semiconductor device measurement; Threshold voltage; Semiconductor device modeling; Contact resistance; effective channel length; field effect mobility; parameter extraction; threshold voltage; THIN-FILM TRANSISTORS; THRESHOLD VOLTAGE; SERIES RESISTANCE; MOBILITY; CRYSTALLINE; MODEL;
D O I
10.1109/TED.2021.3072878
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article presents an analytical method for parameter extraction in oxide semiconductor field-effect transistors (OS FETs), including threshold voltage (V-T), effective channel length (L-eff), source-drain series resistance (R-SD), and intrinsic effective mobility (mu(int)). An analytical expression of effective mobility (mu(eff)) is implemented with the consideration of percolation conduction and R-SD effects. This method relies on the concept of Y-function method and the channel length dependent measurement. The extraction results are compared to those from the combination of transfer length method (TLM). It has been shown that a better accuracy of the extracted parameters is achieved with the proposed method. Furthermore, transfer characteristics are resimulated based on the extracted parameters, in which a good match between measurement and simulation is obtained.
引用
收藏
页码:2717 / 2722
页数:6
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