V-I curves and plasma parameters in a high density DC glow discharge generated by a current-source

被引:10
作者
Granda-Gutierrez, E. E. [1 ]
Lopez-Callejas, R. [1 ,2 ]
Pena-Eguiluz, R. [2 ]
Valencia A, R. [2 ]
Mercado-Cabrera, A. [2 ]
Barocio, S. R. [2 ]
de la Piedad-Beneitez, A. [1 ]
Benitez-Read, J. S. [1 ,2 ]
Pacheco-Sotelo, J. O. [1 ,2 ]
机构
[1] Inst Tecnol Toluca, AP 890, Toluca, Estado Mexico, Mexico
[2] Inst Nacl Invest Nucl, Mexico City 11801, DF, Mexico
来源
PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY | 2008年 / 100卷
关键词
D O I
10.1088/1742-6596/100/6/062019
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nitrogen DC glow discharges, conducted in a cylindrical geometry, have been characterized using a new current-source able to provide 10(-3) - 3 A for the sustainment of the discharge, instead of a conventional voltage-source. The V-I characteristic curves obtained from these discharges were found to fit the general form i(nu) = A(p)nu(k(p)), whereby the plasma itself can be modeled as a voltage-controlled current-source. We conclude that the fitting parameters A and k, which mainly depend on the gas pressure p, are strongly related to the plasma characteristics, so much so that they can indicate the pressure interval in which the maximum plasma density is located, with values in the order of 10(16) m(-3) at reduced discharge potential (300-600 V) and low working pressure (10(-1) - 10(1) Pa).
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页数:4
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共 11 条
  • [1] PSpice simulation of one atmosphere uniform, glow discharge plasma (OAUGDP) reactor systems
    Chen, ZY
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2003, 31 (04) : 511 - 520
  • [2] Experimental investigation of hybrid-evaporation-glow discharge plasma immersion ion implantation
    Li, LH
    Wu, YQ
    Zhang, YH
    Fu, RKY
    Chu, PK
    [J]. JOURNAL OF APPLIED PHYSICS, 2005, 97 (11)
  • [3] Instrumentation for plasma immersion ion implantation
    López-Callejas, R
    Valencia-Alvarado, R
    Muñoz-Castro, AE
    Godoy-Cabrera, OG
    Tapia-Fabela, JL
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2002, 73 (12) : 4277 - 4282
  • [4] Hollow cathode magnetron deposition of AlN thin films: Crystalline structure and morphology
    Pessoa, RS
    Murakami, G
    Petraconi, G
    Maciel, HS
    Oliveira, IC
    Grigorov, KG
    [J]. BRAZILIAN JOURNAL OF PHYSICS, 2006, 36 (2A) : 332 - 335
  • [5] Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR
    Pu, YK
    Guo, ZG
    Kang, ZD
    Ma, J
    Guan, ZC
    Zhang, GY
    Wang, EG
    [J]. PURE AND APPLIED CHEMISTRY, 2002, 74 (03) : 459 - 464
  • [6] Raizer YP., 1997, GAS DISCHARGE PHYS
  • [7] ROTH R, 1998, IND PLASMA ENG, V1
  • [8] Simulations for the effect of chamber geometry on oxygen plasma characteristics for very large plasma sources
    Takechi, Kazushige
    Otsuki, Shigeyoshi
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2006, 19 (03) : 286 - 291
  • [9] A MODEL FOR STEADY-STATE LARGE-VOLUME PLASMA GENERATION
    UHM, HS
    MILLER, JD
    SCHNEIDER, RF
    WEIDMAN, DJ
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (03) : 535 - 542
  • [10] VALENCIA R, 2004, SUPERFICIES VACIO, V17, P16