Effects of halogen doping on structure of silica glass as a photonic material

被引:0
作者
Kakiuchida, F [1 ]
Saito, K [1 ]
Hiramitsu, N [1 ]
Ikushima, AJ [1 ]
机构
[1] Toyota Technol Inst, Frontier Mat Lab, Tempaku Ku, Nagoya, Aichi 4688511, Japan
来源
APPLICATIONS OF PHOTONIC TECHNOLOGY 5: CLOSING THE GAP BETWEEN THEORY, DEVELOPMENT, AND APPLICATION | 2002年 / 4833卷
关键词
Rayleigh scattering; ultraviolet absorption edge; infrared absorption; silica glass; structural relaxation; fictive temperature; density fluctuation; fluorine dopant;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
In silica glass frozen-in temperature of glass structure, so-called the fictive temperature, is strongly related to optical properties such as the Rayleigh scattering intensity and location of ultraviolet absorption edge. We investigated these optical properties with respect to the fictive temperature of samples with various fluorine concentrations. Furthermore, the structural relaxation during glass forming process was systematically examined. We have found that doping of fluorine strongly encourages the structural relaxation and lowers the fictive temperature. We have also found that relations between the fictive temperature and the optical properties vary sensitively to fluorine concentration.
引用
收藏
页码:504 / 512
页数:9
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