Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

被引:12
作者
Koshtyal, Yury [1 ]
Mitrofanov, Ilya [1 ]
Nazarov, Denis [1 ,2 ]
Medvedev, Oleg [1 ]
Kim, Artem [1 ]
Ezhov, Ilya [1 ]
Rumyantsev, Aleksander [1 ,3 ]
Popovich, Anatoly [1 ]
Maximov, Maxim Yu [1 ]
机构
[1] Peter Great St Petersburg Polytech Univ, St Petersburg 195221, Russia
[2] St Petersburg State Univ, St Petersburg 199034, Russia
[3] Ioffe Inst, St Petersburg 194021, Russia
基金
俄罗斯科学基金会;
关键词
atomic layer deposition; nickel– cobalt oxide; anode materials; solid– state Li-ion batteries; overcapacity; SEI; ELECTRICAL-PROPERTIES; NANOWIRE GROWTH; OXIDE; ELECTROLYTES; CATHODE; SURFACE; PERFORMANCE; CONVERSION; BATTERIES; LIFEPO4;
D O I
10.3390/nano11040907
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15-30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface-SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.
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页数:18
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共 74 条
  • [11] Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process
    Boenhardt, Sascha
    Kuehnel, Kati
    Kia, Alireza M.
    Weinreich, Wenke
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 37 (03):
  • [12] Nanomaterials for rechargeable lithium batteries
    Bruce, Peter G.
    Scrosati, Bruno
    Tarascon, Jean-Marie
    [J]. ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2008, 47 (16) : 2930 - 2946
  • [13] Thermal-induced formation of domain structures in CuO nanomaterials
    Cao, Fan
    Jia, Shuangfeng
    Zheng, He
    Zhao, Lulu
    Liu, Huihui
    Li, Lei
    Zhao, Ligong
    Hu, Yongming
    Gu, Haoshuang
    Wang, Jianbo
    [J]. PHYSICAL REVIEW MATERIALS, 2017, 1 (05):
  • [14] Recent progress in conversion reaction metal oxide anodes for Li-ion batteries
    Cao, Kangzhe
    Jin, Ting
    Yang, Li
    Jiao, Lifang
    [J]. MATERIALS CHEMISTRY FRONTIERS, 2017, 1 (11) : 2213 - 2242
  • [15] CeraCharge, 2020, BACKUP BATTERY REAL
  • [16] The influence of process conditions on the phase composition of the LiFePO4 film obtained by the atomic layer method
    Chernyaeva, O. Y.
    Kyashkin, V. M.
    Ivleva, A. Y.
    Yrova, V. Y.
    Solovyova, E. O.
    [J]. POLYHEDRON, 2019, 157 : 297 - 300
  • [17] Mechanistic Study of Lithium Aluminum Oxide Atomic Layer Deposition
    Comstock, David J.
    Elam, Jeffrey W.
    [J]. JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (04) : 1677 - 1683
  • [18] Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
    Donders, M. E.
    Arnoldbik, W. M.
    Knoops, H. C. M.
    Kessels, W. M. M.
    Notten, P. H. L.
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2013, 160 (05) : A3066 - A3071
  • [19] Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
    Donders, M. E.
    Knoops, H. C. M.
    Kessels, W. M. M.
    Notten, P. H. L.
    [J]. ATOMIC LAYER DEPOSITION APPLICATIONS 7, 2011, 41 (02): : 321 - 330
  • [20] GOLDSTEIN M., IEEE COMPUTER SOC PH